-
M.A.Hayashi, C.Campos, L.P. Cardoso, J.M.Sasaki e L.C.Kretly,
``Difracao de Raios X no Estudo do Perfil de Tensoes em Semicondutores Implantados'',
Pesquisa e Desenvolvimento Tecnológico,
19(1-4), 49-50,
(1995).
-
E.da Silva Braga, L.Cescato, J.Frejlich e M.A.R.Alves,
``An MIS diode employing a-C:H film as the insulator'',
Vaccum,
46(12), 1461-1463,
(1995).
-
H.A.de Amorim, M.A.R.Alves, E.da Silva Braga, J.Frejlich e L.Cescato,
``Optical and Electrical Characteristics of DLC Film Growth at Low Temperature PEVCD'',
Brazilian Journal of Chemical Engineering,
12(3), 126-138,
(1995).
-
L.C.Kretly, E.G.S. de Cencig e E.C.Bortolucci,
``Mask and Reticle Fabrication Using Electron-beam Lithography in a Research and Development Laboratory'',
XVI Congresso Bras. de Aplicações de Vácuo na Indústria e na Ciência,
(1995).
-
J.A.Diniz, P.J.Tatsch, L.C.Kretly, J.E.C. de Queiroz e J.Godoy Filho,
``Formation of Thin Silicon Oxynitride Layers by Low-Energy Nitrogem Implantation'',
X Sbmicro - I Ibermicro ,
1, 383,
(1995).
-
S.J , M.Favoreto, L.C.Kretly, J.E.C. de Queiroz e C.Teani,
``Experimental Study of Ion Implantation of Si in GaAs and its Activation by Rapid Thermal Annealing'',
X Sbmicro - I Ibermicro ,
1, 701,
(1995).
-
L.C.Kretly e E.G.S. de Cencig,
``Electron-Beam Litography Process for Mask and Reticle Production in a Research and Development Laboratoty (Painel)'',
X Sbmicro - I Ibermicro ,
1, 727,
(1995).
-
C.A.B.Cargia, G.Oliveira Neto, F.Galembeck, L.C.Kretly, J.E.C. de Queiroz, E.G.S. de Cencig e E.C.Bortolucci,
``Implantacao Ionica em Poli/Etileno-Co-Acetato de Vinila/(EVA) e sua aplicacao na Construcao de Eletrodos Ion/Seletivos para Potassio'',
VIII Encontro Nacional de Quimica Analitica,
(1995).
-
L.C.Kretly, F.Galembeck, G.Oliveira Neto, J.E.C. de Queiroz, E.G.S. de Cencig, C.A.B.Garcia e E.C.Bortolucci,
``First Tests with Ion Implantation into EVA Polymer and Perspectives for Electronic Devices Fabrication'',
3o. Congresso Brasileiro de Polimeros,
1, 678-681,
(1995).
-
F.Galembeck, L.C.Kretly, G.de Oliveira Neto, J.E.C.Queiroz de, C.A.B.Garcia, E.C.Bortolucci e E.G.S. de Cencig,
``First tests with ion implantation into EVA polymer and perspectives for electronic devices fabrication'',
3o Congresso Bras. de Polimeros,
2, 678-681,
(1995).
-
P.J.Tatsch, J.A.Diniz, M.Pudensi, L.C.Kretly, J.E.C. de Queiroz e J.Godoy Filho,
``Characterization of Implanted Oxynitrides for Gate Insulator Application in MOS Devices'',
Congresso Brasileiro de Aplicacoes de Vacuo na Industria e na Ciencia,
1,
(1995).
-
L.C.Kretly, F.Galembeck, G.Oliveira Neto, J.E.C. de Queiroz, E.G.S. de Cencig, C.A.B.Garcia e E.C.Bortolucci,
``Ion Implantation Into EVA Polymer and Perspectives Application in Electronic Devices'',
Congresso Brasileiro de Aplicacoes de Vacuo na Industria e na Ciencia,
1,
(1995).
-
L.C.Kretly, E.G.S. de Cencig, E.C.Bortolucci e A.Guassi Jr,
``E-Beam Lithography Using Photoresists for Image Reversal Process'',
Congresso Brasileiro de Aplicacoes de Vacuo na Industria e na Ciencia,
1,
(1995).
-
J.A.Siqueira Dias,
``A proposal for the implementation of ternary digital circuits'',
20th International Conference on Microelectronics,
Iugoslavia ,
2, 485-490,
(1995).
-
L.A.R.Júnior e W.Bueno de Moraes,
``A geometry independent CMOS transconductor new method of linearization and AC analysis'',
1995 20th International Conference on Microelectronics,
Iugoslavia ,
2, 491-496,
(1995).
-
P.A.V.Ferreira, R.S.Mendes, C.A.dos Reis Filho e J.R.de Oliveira,
``A First Laboratory Course in Analysis and Design of Dynamic Systems'',
IFAC Workshop on Control Education and Technology Transfer Issues,
Brasil ,
1, 62-66,
(1995).
-
J.A.Diniz, P.J.Tatsch, L.C.Kretly, J.E.C. de Queiroz e J.Godoy Filho,
``Formation of Ultra-Thin Silicon Oxynitride Films by Low-Energy Nitrogen Implantation'',
1995 FallMeeting, MRS Materials Research Society,
Estados Unidos ,
(1995).