Centro de Componentes Semicondutores
- 1.
- L.C.Kretly e E.C.Bortolucci,
``First Tests with Ion Implantation into EVA Polymer and Perspectives for Electronic Devices Fabrication'',
3o.Congresso Brasiliero de Polimeros,
1, 678-681,
(1996).
- 2.
- J.A.Diniz, P.J.Tatsch, M.A.A.Pudenzi e L.C.Kretly,
``Thin Nitrided-oxide Films formed by Low-energy and Medium Dose Nitrogen Implantation'',
XI Conference of The Brazilian Microelectronics Society,
1, 402-407,
(1996).
- 3.
- L.C.Kretly e J.E.C. de Queiroz,
``Medium Current He+ Beam Extraction Using Auxiliary Solid Material in the Ion Source'',
XI Conference of the Brazilian Microelectronics Society-SBMICRO,
1, 393-396,
(1996).
- 4.
- J.A.Diniz, P.J.Tatsch, M.Pudence, L.C.Kretly e J.K.Helion,
``Thin Nitred Oxided Films Format by Low Energy and Medium Dose Nitrogen Implantation'',
XI Conference of the Brazilian Microelectronics Society-SBMICRO,
1, 402-407,
(1996).
- 5.
- C.P.Guerra e L.C.Kretly,
``He+ Implantation Into Fused Quartz for the Formation of Waveguides Used in Optoelectronic Devices'',
XI Conference of the Brazilian Microelectronics Society-SBMICRO,
1, 397-401,
(1996).
3/2/1998