Faculdade de Engenharia Elétrica e de Computação   Departamento de Máquinas Componentes e Sist. Intelig.   Produções / Trabalhos completos publicados em anais de congresso Trabalhos completos em anais de congressos (internacional)   1.   Moshkalyov, S. A.; Reyes Betanzo, C.; Cotrin, Ricardo; Doi, Ioshiaki; Zakia, M.B.; Diniz, J.A.; Swart, Jacobus Willibrordus; "Etching of Polycrystalline Silicon in SF6 Containing Plasmas", 09/2001, CIENTÍFICO INTERNACIONAL, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.208-211, Pirenópolis, GO, BRASIL, 2001 *   2.   Cotrin, Ricardo; Doi, Ioshiaki; Zakia, M.B.; Swart, Jacobus Willibrordus; Diniz, J.A.; "Grain Size Influence on Sheet Resistance of P- and As-Implanted Polycrystalline Silicon Deposited by Vertical CVD Reactor", 09/2001, CIENTÍFICO INTERNACIONAL, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.215-218, Pirenópolis, GO, BRASIL, 2001   3.   Jimenez Grados, Hugo Ricardo; Swart, Jacobus Willibrordus; Doi, Ioshiaki; Diniz, J.A.; "Project and Development of an Educational CMOS Process", 09/2001, CIENTÍFICO INTERNACIONAL, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.260-263, Pirenópolis, GO, BRASIL, 2001 *   4.   Van Noije, W.A.M.; Swart, Jacobus Willibrordus; Verdonck, P.; Diniz, J.A.; Doi, Ioshiaki; Zakia, Maria Beny; Manzano, R.D.; "Initiatives for Promotion of Microelectronics and Microfabrication at São Paulo State Universities - Brazil", 06/2001, CIENTÍFICO INTERNACIONAL, Fourteenth Biennial University/Government/Industry Microelectronics Symposium, Vol. 1, pp.16-19, Richmond - Virginia, ESTADOS UNIDOS, 2001 *   5.   Diniz, J.A.; Doi, Ioshiaki; Swart, Jacobus Willibrordus; "Characteristics of Silicon Oxynitrides Made by ECR Plasmas", 03/2001, CIENTÍFICO INTERNACIONAL, Sixth International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, Vol. 1, pp.156-162, Washington, ESTADOS UNIDOS, 2001 *   6.   Diniz, J.A.; Godoy Filho, J.; Doi, Ioshiaki; Swart, Jacobus Willibrordus; "Radiation Hardening of Oxynitrides Formed by Low Energy Nitrogen Implantation Into Silicon Prior to Oxidation", 03/2001, CIENTÍFICO INTERNACIONAL, Sixth International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, Vol. 1, pp.163-171, Washington, ESTADOS UNIDOS, 2001 *   * Esta produção está associada também a outros órgãos