CCS - Trabalhos completos em anais de congressos

Centro de Componentes Semicondutores

Produções / Trabalhos completos publicados em anais de congresso

Trabalhos completos em anais de congressos

Nacional

DIAS, G. O.; MESTANZA, S.N.M.; QUEIROZ, J. E. C.; MARINS, E. S. V. P.; DOI, I.; SWART, Jacobus Willibrordus; RODRIGUES, E.; Influence of Post-Annealing Time in gas Passivation on the Photoluminescence Spectral Emission of Silicon Nanaostructure Embedded in SiO2, 04/2005, 12th Brazilian workshop on semiconductor physics.,Vol. 1, pp.1-1, São José dos Campos-SP, SP, Brasil, 2005 *

SANTOS, R. E.; DOI, I.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Influence of Silicidation Temperature on the Ni(Pt) Silicide Stability by AFM and SEM Measurementes, 04/2005, 12th Brazilian workshop on semiconductor physics.,Vol. 1, pp.1-3, São José dos Campos-SP, SP, Brasil, 2005 *

Internacional

OLIVEIRA JÚNIOR, A. C.; DOI, I.; DINIZ, J. A.; A Comparative Analysis of Electrical Characteristics of Silicon Micro-Heaters for Thermal Transducers Applications, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.363-371, Florianópolis, SC, Brasil, 2005 *

MESTANZA, S.N.M.; RODRIGUES, E.; JIMENEZ GRADOS, Hugo Ricardo; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Characterization and Performance Evaluation of an APS Pixel in a Standard 2 um CMOS Technology, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.32-38, Florianópolis, SC, Brasil, 2005 *

DIAS, G. O.; MESTANZA, S.N.M.; QUEIROZ, J. E. C.; MARINS, E. S. V. P.; DOI, I.; RODRIGUES, E.; TEJERO, D.C.B.; Growth and Characterization of Silicon Nanocrystals Obtained by Ion Implantation, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.297-303, Florianópolis, SC, Brasil, 2005 *

C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; DINIZ, J. A.; Morphological and Electrical Study of Poly-SiGe Alloy Deposited by Vertical LPCVD, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.188-196, Florianópolis, SC, Brasil, 2005 *

DINIZ, J. A.; DOI, I.; NELI, ROBERTO RIBEIRO; Process Optimization for Microbolometers Fabrication, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.357-362, Florianópolis, SC, Brasil, 2005 *

BIASOTTO, C.; BOSCOLI, F. A.; C. TEIXEIRA, Ricardo; RAMOS, A.C.S.; DINIZ, J. A.; DALTRINI, A.M.; MOSHKALYOV, S. A.; DOI, I.; Silicon Oxide Sacrificial Layer dor MEMS Applications, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.389-397, Florianópolis, SC, Brasil, 2005 *

SANTOS, R. E.; DOI, I.; HAYASHI, M.A.; DINIZ, J. A.; G. DOS SANTOS FILHO, Sebastião; Thermal Stability of Ni/Pt Silicide Films on BF Doped and Undoped (100)Si, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.197-203, Florianópolis, SC, Brasil, 2005 *

DA SILVA FILHO, A.; FRATESCHI, Newton Cesário; Analisys of a high optical micro sensor based on stadium optical resonators, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 2005, pp.54-58, Florianópolis, SC, Brasil, 2005

KNIZHNIK,, A.; ISKANDAROVA,, I.; BAGATUR'YANTS,, A.; POTAPKIN,, B; FONSECA, L. R. C; KORKIN,, A.; Metal screening for CMOS application through ab-initio interface work function calculations, 09/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 8, pp.165-167, Florianópolis, SC, Brasil, 2005

10.

LIRA, J.G.A.; OLIVEIRA JÚNIOR, A. C.; FREIRE, R. C.S.; DOI, I.; LUCIANO, B.A.; SWART, Jacobus Willibrordus; Dynamic Chacaraterization of Thermo-Resitive Micro-Sensor, 05/2005, IMTC/05 - IEEE - Instrumentation and Measurement Technology Conference,Vol. 1, pp.1647-1651, Otawa, Canadá, 2005 *

11.

NUNES, A. M.; MOSHKALYOV, S.; TATSCH, Peter Jurgen; MOSHKALYOV, S.A.; "Plasma etching of polysilicon and silicon nitride films for application in MEMS and CMOS devices", 03/2005, Workshop on Semiconductors and Micro & Nano-Technology - SEMINATEC 2005,Vol. 1, pp.35-35, CAMPINAS, SP, Brasil, 2005 *

12.

BIASOTTO, C.; BOSCOLI, F. A.; C. TEIXEIRA, Ricardo; RAMOS, A.C.S.; DINIZ, J. A.; DALTRINI, A.; S.A., MOSHKALYOV; DOI, I.; Silicon Oxide Sacrificial Layer for MEMS Applications., 01/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 2005-8, pp.389-397, Florianópolis, SC, Brasil, 2005 *

13.

MONTEIRO, M.J.R.; KOSTRYUKOV, A.; DALTRINI, A.; S.A., MOSHKALYOV; MACHIDA, M.; BESSELER, E.; Inductively Coupled Plasma Test Reactor Development and Plasma Measurements., 01/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 2005-8, pp.226-234, Florianópolis, SC, Brasil, 2005

14.

DALTRINI, A.; MONTEIRO, M.J.R.; KOSTRYUKOV, A.; S.A., MOSHKALYOV; MACHIDA, M.; BESSELER, E.; Langmuir Probe and Optical Emission Spectroscopy Study of an Inductively Coupled Plasma Source., 01/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 2005-8, pp.245-253, Florianópolis, SC, Brasil, 2005

15.

KOSTRYUKOV, A.; MONTEIRO, M.J.R.; S.A., MOSHKALYOV; DALTRINI, A.; MACHIDA, M.; BESSELER, E.; SWART, Jacobus Willibrordus; ICP Reactor Development and Plasma Characterization., 01/2005, Workshop on Semiconductors and Micro & Nano-Technology - SEMINATEC 2005,Vol. 1, pp.36-38, CAMPINAS, SP, Brasil, 2005 *

16.

GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; CAMOLESI, A.; FRUETT, Fabiano; DINIZ, J. A.; TATSCH, Peter Jurgen; A CMOS Technology for educational activities and academic projects., 01/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 1, pp.1-3, Florianópolis, SC, Brasil, 2005 *

17.

MUNOZ, S. N. M.; RODRIGUEZ, E.M.; GRADOS, H. R. Jimenez; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Characterization and performance evaluation of a APS pixel in a standard 2 m CMOS Technology., 01/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 2005-8, pp.1-3, Florianópolis, SC, Brasil, 2005 *

18.

GRADOS, H. R. Jimenez; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Development of a 2 m twin-well CMOS Process for academic application. In: Workshop on Semiconductors and Micro & Nano Technology, 01/2005, Workshop on Semiconductors and Micro & Nano-Technology - SEMINATEC 2005,Vol. 1, pp.72-74, CAMPINAS, SP, Brasil, 2005 *

19.

MESTANZA, S.N.M.; MUNOZ, S. N. M.; Growth and Characterization of Silicon Nanocrystals Obtained by Ion Implantation., 01/2005, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005,Vol. 2005, pp.297-303, Florianópolis, SC, Brasil, 2005

20.

S.A., MOSHKALYOV; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; ZOCCAL, LEONARDO BRESEGHELLO; DALTRINI, A.; The Efficacy of ECR-CVD Silicon Nitride Passivation in InGaP/GaAs HBTs., 01/2005, 27th International Symposium on Dry Process,Vol. 1, pp.1-3, Jeju City, Coréia do Sul, 2005 *

21.

DALTRINI, A.; S.A., MOSHKALYOV; MONTEIRO, M.J.R.; MACHIDA, M.; KOSTRYUKOV, A.; BESSELER, E.; BIASOTTO, C.; DINIZ, J. A.; Plasma Diagnostics in High Density Reactors., 01/2005, XI Latin American Workshop on Plasma Physics,Vol. 1, pp.1-3, Cidade do México, México, 2005 *

22.

DALTRINI, A.; MONTEIRO, M.J.R.; MACHIDA, M.; Measurements of Ion Temperature in NOVA-UNICAMP Tokamak., 01/2005, 8th Brazilian Meeting on Plasma Physics,Vol. 1, pp.34-37, Niterói, RJ, Brasil, 2005

23.

MACHIDA, M.; DALTRINI, A.; MONTEIRO, M.J.R.; Z effective Determination in NOVA-UNICAMP Tokamak., 01/2005, 8th Brazilian Meeting on Plasma Physics,Vol. 1, pp.33-36, Niterói, RJ, Brasil, 2005

24.

MACHIDA, M.; KAMINISHIKAWAHARA, Celso Ossamu; DALTRINI, A.; MONTEIRO, M.J.R.; Electron Temperature and Density Determination Using Langmuir Probe in NOVA-UNICAMP Tokamak, 01/2005, 8th Brazilian Meeting on Plasma Physics,Vol. 1, pp.33-36, Niterói, RJ, Brasil, 2005

25.

NUNES, A. M.; TATSCH, Peter Jurgen; S.A., MOSHKALYOV; DALTRINI, A.; MACHIDA, M.; Thinning Technology for CMOS Transistor Gate Fabrication Using Reactive Ion Etching in Fluorine Plasmas, 01/2005, 8th Brazilian Meeting on Plasma Physics,Vol. 1, pp.28-31, Niterói, RJ, Brasil, 2005

26.

DALTRINI, A.; S.A., MOSHKALYOV; MONTEIRO, M.J.R.; KOSTRYUKOV, A.; BESSELER, E.; BIASOTTO, C.; DINIZ, J. A.; MACHIDA, M.; Plasma Reactors for Material Processing at CCS-UNICAMP, 01/2005, 8th Brazilian Meeting on Plasma Physics,Vol. 1, pp.22-25, Niterói, RJ, Brasil, 2005

27.

BIASOTTO, C.; BOSCOLI, F. A.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; DALTRINI, A.; S.A., MOSHKALYOV; DOI, I.; Silicon Oxide Deposition by ECR Plasma for MEMS Applications., 01/2005, DPS 2005 - 5th International Symposium on Dry Process,Vol. 1, pp.383-386, Jeju, Coréia do Sul, 2005

28.

BIASOTTO, C.; DINIZ, J. A.; DALTRINI, A.; S.A., MOSHKALYOV; RAMOS, A.C.S.; SWART, Jacobus Willibrordus; Suspended Silicon Oxynitride Structures Fabricated by ECR Plasma and Wet Etching., 01/2005, DPS 2005 - 5th International Symposium on Dry Process,Vol. 1, pp.387-390, Jeju, Coréia do Sul, 2005

* Esta produção está associada também a outros órgãos