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Faculdade de Engenharia Elétrica e de Computação
Departamento de Semicondutores, Instrumentos e Fotônica
Produções / Artigos publicados em periódicos
Artigos publicados em periódicos especializados arbitrados
Circulação Nacional
1.
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DOI, I.; MARINS, E. S. V. P.; MESTANZA, S.N.M.; Influence of Nucleotion Parameters in Spatial Distribution of the Ge Nanocrystals., 10/2006, Activity Report (Laboratório Nacional de Luz Síncrotron),Vol. 1, pp.1-3, Campinas, SP, Brasil, 2006 *
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2.
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DOI, I.; MARINS, E. S. V. P.; SWART, Jacobus Willibrordus; C. DE QUEIROZ, Jose Eudoxio; Influence of Post-Annealing Time in Gas Passivation on the Photoluminescence Spectral Emission of Silicon Nanostructures Embedded in SiO2., 11/2006, Activity Report (Laboratório Nacional de Luz Síncrotron),Vol. 1, pp.1-3, Campinas, SP, Brasil, 2006 *
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3.
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DOI, I.; MARINS, E. S. V. P.; C. DE QUEIROZ, Jose Eudoxio; Ligth Gain from Silicon Nanocrystals by Passivation., 10/2006, Activity Report (Laboratório Nacional de Luz Síncrotron),Vol. 1, pp.1-3, Campinas, SP, Brasil, 2006 *
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4.
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CASTALDO, F. C.; DOS REIS FILHO, Carlos Alberto; "Magnetically-coupled current sensor using an integrated coil and a CMOS Transistor", 03/2006, Eletronica de Potencia,Vol. 11, pp.233-238, Santa Maria, RS, Brasil, 2006
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Circulação Internacional
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MSC. RICARDO COTRIN TEIXEIRA -, MSc. Ricardo Cotrin Teixeira -; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; "Morphological study of polycrystalline SiGe alloy deposited by vertical LPCVD", 06/2006, Brazilian Journal of Physics,Vol. 36, Fac. 2a, pp.466-469, São Paulo, SP, Brasil, 2006
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2.
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MSC. RICARDO COTRIN TEIXEIRA -, MSc. Ricardo Cotrin Teixeira -; DOI, I.; DINIZ, J. A.; PROF. DR. JACOBUS W SWART - PE, Prof. Dr. Jacobus W Swart - Pe; ZAKIA, M. B. P.; Morphological study of polycrystalline SiGe alloy deposited by vertical LPCVD, 12/2006, Brazilian Journal of Physics,Vol. 36, Fac. 2A, pp.466-469, São Paulo, SP, Brasil, 2006 *
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3.
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ABBADE, M.L.F.; FAGOTTO, E.A.M.; MOSCHIM, Edson; Quaternary Optical Packets Generated by Fiber Four-Wave, 01/2006, IEEE Photonics Technology Letters,Vol. 18, Fac. 1, pp.331-333, Estados Unidos da América, 2006
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4.
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LIRA, J.G.A.; OLIVEIRA JÚNIOR, A. C.; FREIRE, R. C.S.; DOI, I.; LUCIANO, B.A.; SWART, Jacobus Willibrordus; Dynamic Characterization of Thermo-Resistive Micro-Sensor, 01/2006, IEEE Transaction on Instrumentation and Measurements,Vol. 3, pp.1647-1651, New York, Estados Unidos da América, 2006 *
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5.
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VERÍSSIMO, C.; S.A., MOSHKALYOV; RAMOS, ANTONIO CARLOS DA S; GONÇALVES, José Lino; ALVES, O.L.; SWART, Jacobus Willibrordus; Different carbon nanostructured materials obtained in catalytic chemical vapor deposition, 09/2006, Journal of the Brazilian Chemical Society,Vol. 17, Fac. 6, pp.1124-1132, São Paulo, SP, Brasil, 2006 *
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6.
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MESTANZA, S.N.M.; RODRIGUEZ, E.M.; BIASOTTO, C.; DINIZ, J. A.; SWART, Jacobus Willibrordus; "Characterization and modeling of antireflective coating of SiO2, SiN4 and SiOxNy Deposited by ECR-CVD", 01/2006, Journal of Vacuum Science and Technology. B: Microelectronics Processing and Phenomena,Vol. 24, pp.1-5, New York, Estados Unidos da América, 2006
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7.
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LEONARDO BRESEGHELLO ZOCCAL, Leonardo Breseghello Zoccal; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; DALTRINI, A.; S.A., MOSHKALYOV; The efficacy of ECR-CVD silicon nitride passivation in InGaP/GaAs HBTs, 01/2006, Journal of Vacuum Science and Technology. B: Microelectronics Processing and Phenomena,Vol. 1, Fac. 1, pp.1-3, New York, Estados Unidos da América, 2006 *
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8.
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MESTANZA, S.N.M.; RODRIGUES, E.; BIASOTTO, C.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Characterization and Modeling of Antireflective Coatings of SiO2, Si_3 N_4, and SiOxNy Deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition, 03/2006, Journal vaccum science and technology B,Vol. 24, Fac. 2, pp.823-827, New York, Estados Unidos da América, 2006 *
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9.
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BIASOTTO, C.; DINIZ, J. A.; DALTRINI, A.; S.A., MOSHKALYOV; DOI, I.; DR. MARCELO DE JESUS RANGEL MO, Dr. Marcelo de Jesus Rangel Mo; SWART, Jacobus Willibrordus; Silicon nitride suspended membranes deposited by ECR-CVD plasma., 01/2006, Materials Science and Engineering. B, Solid State Materials for Advanced Technology,Vol. 1, Fac. 1, pp.1-3, Amsterdam, Holanda, 2006 *
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10.
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MSC. RICARDO COTRIN TEIXEIRA -, MSc. Ricardo Cotrin Teixeira -; DOI, I.; PROF. DR. JACOBUS W SWART - PE, Prof. Dr. Jacobus W Swart - Pe; DINIZ, J. A.; ZAKIA, M. B. P.; CV characteristics of polycrystalline SiGe Films with Low GE Concentration, 12/2006, Nuclear Instruments & Methods in Physics Research. Section B. Beam Interactions with Materials and Atoms,Vol. 253, Fac. 1-2, pp.37-40, Amsterdam, Holanda, 2006 *
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11.
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NELI, ROBERTO RIBEIRO; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Development of process for far infrared sensor fabrication, 01/2006, Sensors and Actuators. A, Physical,Vol. 1, Fac. 1, pp.400-406, Lausanne, Suiça, 2006 *
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12.
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DOI, I.; NELI, ROBERTO RIBEIRO; DINIZ, J. A.; SWART, Jacobus Willibrordus; Development of Process for Far Infrared Sensor Fabrication, 01/2006, Sensors and Actuators. A, Physical,Vol. 131, pp.400-406, Lausanne, Suiça, 2006 *
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13.
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BIASOTTO, C.; BOSCOLI, F. A.; MSC. RICARDO COTRIN TEIXEIRA -, MSc. Ricardo Cotrin Teixeira -; DINIZ, J. A.; DALTRINI, A.; S.A., MOSHKALYOV; DOI, I.; Silicon Oxide Deposition by ECR Plasma for MEMS Applications, 01/2006, Thin Solid Films,Vol. 1, pp.1-3, Lausanne, Suiça, 2006 *
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* Esta produção está associada também a outros órgãos
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