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CIOLDIN, F. H.; SANTOS, M. V. P.; DOI, I.; DINIZ, J. A.; FLACKER, A.; FINARDI, M. R.; TESCHKE, O.; BONUGLI, L.O.; A. ZAMBOTTI, Eduardo; GODOY FILHO, J.; Raman study of Nickel-Platinum Silicide formed by RTP process, 09/2013, 28th Symposium on Microelectronics Technology and Devices - SBMICRO 2013,Vol. 1, pp.1-4, Curitiba, PR, Brasil, 2013 *
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