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CARNIO, C. V.; LEONHARDT, A.; SILVA, A. R.; CIOLDIN, F. H.; DOI, I.; MANERA, L. T.; DINIZ, J. A.; TiN gate electrodes fabrication by Ti e-beam evaporation and ECR plasma nitridation, 01/2016, Materials for Advanced Metallization - MAM 2016,pp.1-4, Brussels, Bélgica, 2016. Resumo expandido *
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